SAN JOSE, Calif., March 1, 2011 /PRNewswire/ — Fellow eBeam Initiative members D2S™, an emerging supplier of computational design platforms, and NuFlare Technology, Inc., a world leader in electron beam mask writing systems, today announced a partnership to provide a D2S option for the NuFlare EBM-7000 mask writing system.  A new interface developed between NuFlare and D2S enables the overlapping of shots that was previously not allowed in NuFlare machines.  Further, NuFlare today announced that the EBM-7000 an…

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